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Photox - Photoresist Stripper

  • Electronic Chemicals at competitive price
  • Image 2
Price:
$75.00
SKU:
ACL-330
Weight:
11.00 LBS
Availability:
This product normally ships in 3 business days
Shipping:
Calculated at checkout
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Product Information

High Performance Positive Photoresist Stripper

PHOTOX- ACL-330 from Applied Chemical Laboratories, Inc. is an advanced positive photoresist stripper specifically formulated for bulk resist removal from electronic substrates. ACL-330 has proven efficacy in semiconductor, flat panel display, magnetic and optical media manufacturing.

Equally effective as EKC 830 and PRS 2000.  You can't buy better, but you can pay more!

Product Features:

  • Excellent for removal of advanced G-line, I-line, and DUV photoresists (248 & 193nm) including bi-layer resists
  • 100% Residue free cleaning
  • Non-corrosive to Al, Al-Cu alloys, Ti, & W
  • Zero etch rate to oxides and common dielectric thin films
  • High loading (>2000 8” equivalent wafers)
  • Low odor
  • 100% Water soluble
  • Non-flammable
  • Long bath and shelf life for extended use
  • Immersion and spray tool compatible
  • Environment & operator safe formulation

 

 

Developed by inventors of numerous related US and World Organization patents.

PHOTOX is a Trademark of Applied Chemical Laboratories, Inc.

Product Specs & MSDS

Appearance:
Clear Liquid
Boiling Point:
167 deg C (333 deg. F)
Flash Point:
95 deg. C (203 deg. F)
pH:
6.5 - 7.5 (10% in water)
MSDS:
Datasheet:

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